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Authors
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Zschech, D. ; Milenin, A. P. ; Scholz, R. ; Hillebrand, R. ; Sun, Y. ; Uhlmann, P. ; Stamm, M. ; Steinhart, M. ; Gösele, U.
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Title
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Transfer of sub-30-nm patterns from templates based on supramolecular assemblies
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Date
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01.11.2007
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Number
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15472
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Abstract
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In conclusion, SMA templates based on PS-b-PVP and HABA with periods in the sub-30-nm range can easily be developed by extracting the additive HABA. No pretreatment of the substrates and no staining or cross-linking of the SMA templates are required for the pattern transfer by RIE. Therefore, SMA templates might be an interesting alternative to established BC templates.
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Publisher
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Macromolecules
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Wikidata
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Citation
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Macromolecules 40 (2007) 7752-7754
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DOI
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https://doi.org/10.1021/ma071136l
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Tags
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block-copolymer lithography thin-films diblock copolymers arrays fabrication
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