Authors
|
Stadermann, J. ; Erber, M. ; Komber, H. ; Voit, B.
|
Title
|
Functionalized block copolymers fort he preparation of patterned and functional surfaces
|
Date
|
25.02.2010
|
Number
|
23142
|
Abstract
|
Herein, the synthesis and characterization of new functionalized block copolymers is reported. The polymer materials consisting of a polar block with acid groups and a nonpolar block with alkyne units show a strong tendency of phase segregation. Techniques like NMR, GPC and DSC were applied to verify structure, molar masses, molecular weight distributions and thermal properties. Thin films of these polymers show a distinct surface patterning of mesoscopic dimension. Furthermore, phase separated photosensitive block copolymers were designed and the fabrication of self assembled and additionally photopatternable polymer surfaces is demonstrated.
|
Publisher
|
Polymer Preprints
|
Wikidata
|
|
Citation
|
Polymer Preprints 51 (2010) 336
|
DOI
|
http://abstracts.acs.org/chem/239nm/program/view.php?obj_id=12236
|
Tags
|
|