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Authors
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Messerschmidt, M. ; Millaruelo, M. ; Komber, H. ; Häußler, L. ; Voit, B. ; Krause, T. ; Yin, M. ; Habicher, W.D.
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Title
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Synthesis of partially protected block copolymers based on 4-hydroxystyrene using NMRP and a sequence of polymer analogous reactions
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Date
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15.05.2008
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Number
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16158
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Abstract
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We present the synthesis and characterization of a family of partially protected block copolymers and their precursors synthesized by means of nitroxide mediated radical polymerization (NMRP) and a sequence of quantitative and orthogonal polymer analogous reactions. The target materials consist of an unprotected 4-hydroxystyrene block and a tert-butoxycarbonyl (BOC) or a tert-butyl (TBU) protected block. Corresponding precursor block copolymers exhibit low polydispersity indexes (PDI) (<1.36) and show well-defined compositions of their blocks. Techniques like NMR, FT-IR, GPC, DSC, and TGA were applied in order to verify structure, compositions, molar masses, molecular weight distributions, and thermal properties. These materials are promising candidates for self-assembly in thin films and subsequent photolithographic patterning applications.
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Publisher
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Macromolecules
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Wikidata
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Citation
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Macromolecules 41 (2008) 2821-2831
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DOI
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https://doi.org/10.1021/ma7025308
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Tags
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anionic living polymerization free-radical polymerizations diblock copolymer thin-films microdomain orientation bottom-up top-down patterns poly(4-hydroxystyrene) fabrication
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