Authors Stadermann, J. ; Riedel, M. ; Voit, B.
Title Nanostructured films of block copolymers functionalized with photolabile protected amino groups
Date 23.01.2013
Number 34306
Abstract Two phase separating block copolymers with photolabile protected amino groups in one block have been synthesized through RAFT polymerization followed by efficient click modification. Techniques like NMR, GPC, and DSC were applied for the characterization of these functional materials. The block copolymers were used for the preparation of thin films where they assemble to form distinct nanostructures as detected by AFM analysis.
Publisher Macromolecular Chemistry and Physics
Citation Macromolecular Chemistry and Physics 214 (2013) 263-271
Tags block copolymers nanostructure phase separation photolabile thin films self-assembled monolayers nanoporous thin-films click chemistry diblock copolymers raft polymerization surfaces semiconductor lithography templates pattern

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