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Authors LeMieux, M.C. ; Minko, S. ; Usov, D. ; Shulha, H. ; Stamm, M. ; Tsukruk, V. V.
Title Manipulating Polymer Interfaces: Adaptive Morphology of Mixed Brushes in a Selective and Non-selective Surrounding
Date 01.09.2004
Number 12538
Abstract The conformation of a polymer chain is highly adaptive to changes in the surrounding environment. Advances in nanoscale fabrication have led to the development of nanodevices in which the surface properties can be manipulated in order to perform complex sensing functions. Indeed, polymer surfaces must now be engineered to both protect a substrate and adapt its conformation, or respond to environmental conditions. Mixed polymer brushes enhance the responsive range of a polymer modified surface due to more possible surface chemistry configurations, as well as having a larger combination of chain morphology and segregation modes within the brush. In this work, a binary polymer brush composed of two incompatible polymers, poly(methyl acrylate) (PMA) and poly(styrene-co-2,3,4,5,6-pentafluorostyrene) (PSF), were imaged in several selective and non-selective solvents to reveal the wide range of morphologies possible in one polymer film. Direct measurements in the various solvent conditions were compared with results in the dry state immediately after the specific solvent exposure. Thus for the first time, it is directly shown that the morphology and chain ordering in the dry state after exposure to specific conditions is closely associated to the corresponding solvated case. Micromechanical analysis in fluidic conditions indicates that the level of vertical reordering in the brush is enhanced in selective solvents compared to the non-selective case.<br /><br />Functional Polymer Thin Films for Switching, Sensing, and Adaptive Applications<br />The 227th ACS National Meeting, Anaheim, CA, March 28-April 1, 2004
Publisher Polymeric Materials: Science and Engineering
Wikidata
Citation Polymeric Materials: Science and Engineering 90 (2004) 372-373
DOI http://oasys2.confex.com/acs/227nm/techprogram/P715883.HTM
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