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Authors
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Gowd, E. B. ; Stamm, M.
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Title
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Highly ordered nanoporous thin films from block copolymer supramolecular assembly
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Date
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14.08.2009
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Number
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20742
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Abstract
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Fabrication of laterally ordered ultradense arrays of nanscopic elements using self-organizing systems is a highly relevant and interesting topic of research today, owing to its potential contributions to device miniaturization with revolutionary applications ranging from electronics to biomedicine. In the present work, we have demonstrated that supramolecular assembly (SMA) approach to produce thin film arrays of cylindrical block copolymer domains with good long range order. We successfully identified mesogenic additives, which can form SMA with polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) block copolymer and investigated the microphase separation in thin films of SMA in presence of mesogenic 4-hydroxybiphenyl. Improvement of lateral order is observed in SMA thin films compared to that of PS-b-P4VP block copolymer thin films, which may be due to the highly directional hydrogen bonding between P4VP and 4-hydroxybiphenyl and self-assembly of 4-hydroxybiphenyl within the cylinders. Selective extraction of 4-hydroxybiphenyl from the SMA created empty pores whose walls were lined with P4VP chains. Furthermore, we found that the selectivity of the solvent to the additive has a significant role in switching the orientation of the domains in SMA thin films.
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Publisher
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Polymeric Materials: Science and Engineering
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Wikidata
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Citation
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Polymeric Materials: Science and Engineering 101 (2009) 1106-1107
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DOI
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http://oasys2.confex.com/acs/238nm/techprogram/P1296751.HTM
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