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Authors
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Kondyurin, A.V. ; Bilek, M. ; Janke, A. ; Stamm, M. ; Luchnikov, V.
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Title
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Nanostructured carbonized thin films produced by plasma immersion ion implantation of block-copolymer assemblies
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Date
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05.12.2008
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Number
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18405
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Abstract
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We present a new approach for the fabrication of highly ordered carbonized nanostructured thin films involving the ion beam treatment of self-assembled block copolymers precursors. 70 nm-thick porous polystyrene-block-poly(4-vinyl pyridine) assemblies were treated by 20 keV nitrogen ions at fluences of 1015-1016 ions · cm-2. The resulting 35 nm-thick films are almost completely carbonized, as confirmed by FTIR and micro-Raman spectra, and retain hexagonal nanomorphology. The films are mechanically robust, stable at high temperatures and well suited for applications as ultrafiltration membranes, quantum dot or single molecule supports, masks for nanolithography. The carbonization of the films due to ion beam exposure occurred at temperatures much lower than required for pyrolytic carbonization.
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Publisher
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Plasma Processes and Polymers
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Wikidata
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Citation
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Plasma Processes and Polymers 5 (2008) 155-160
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DOI
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https://doi.org/10.1002/ppap.200700111
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Tags
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block-copolymers nanoporous carbons plasma processes polymers self-assembly
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