|
Authors
|
Messerschmidt, M. ; Leuteritz, A. ; Fleischmann, S. ; Voit, B.
|
|
Title
|
Adjustable nanostructure in thin films of p-hydroxy-styrene polymers prepared by controlled radical polymerization
|
|
Date
|
16.03.2006
|
|
Number
|
13696
|
|
Abstract
|
POLY 327 - The 231st ACS National Meeting, Atlanta, GA, March 26-30, 2006<br /><br />A characteristic feature of block copolymer systems is the repulsion between unlike blocks causing microphase separation at mesoscopic length scales. The size and type of ordering can be controlled varying the molecular weight, chemical structure, molecular architecture and composition of the block copolymers. Understanding and controlling the morphology of a block copolymer is essential for any application and allows for selective surface patterning in thin films. Here we employ block copolymers based on p-hydroxystyrene. They consist of a block with protected phenolic OH groups and a further block with unprotected phenolic OH groups. The big difference in the polarity of the two blocks causes a strong incompatibility which result in a phase separation even for blocks of low molecular weight. The gradual removal of a protecting group leads to a change of the composition of the block copolymer which affects the morphology. The synthesis of the block copolymers was carried out applying nitroxide mediated free radical polymerization (NMRP).Of special interest was the preparation of block copolymers with one Boc protected block since those protecting groups can be removed by simple thermal treatment. These structures were acheived by multiple polymer analogous reactions. The resulting products showed highly ordered nanostructure in thin films.
|
|
Publisher
|
Polymer Preprints
|
|
Wikidata
|
|
|
Citation
|
Polymer Preprints 47 (2006) 506
|
|
DOI
|
http://oasys2.confex.com/acs/231nm/techprogram/P929811.HTM
|
|
Tags
|
|
