Ellipsometry

Null-Ellipsometer "Multiscope" Optrel, Berlin

Ellipsometer SE 402

 

 Accuracy Δ±0.005°, Ψ±0.005°

- Information about layers growth (ex- or in-situ) and optical properties of the samples can be derived, using the ellipsometry method.
- surface modification
- swelling phenomena
- "in situ" monitoring of adsorption processes at interfaces
- red He-Ne laser with a wavelenght 632.8 nm is used

For further information please contact: Dr. Sebastian Rauch
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Sentech Instruments GmbH, Berlin

The ellipsometer delivers information about the surface modification (thickness) of substrates.
- red He-Ne laser with a wavelenght 632.8 nm is used
- incident angle of the laser measures at 70°
- After the sample surface is reached, the reflected light passes through the analyzer and drops onto a photo multiplier, which operates as a detector
- The control of the ellipsometer and the data evaluation requires special software.

For further information please contact: Dr. Sebastian Rauch
__________________________________________