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Riedel, M. ; Stadermann, J. ; Komber, H. ; Voit, B.
Pentafluorostyrene containing block copolymers for application in nanostructuring

POLY 201 - The generation of nanometer-sized structures in thin films is one subject of the current research. Block copolymers are particularly interesting in terms of their ability to self-assemble, due to the connectivity of two chemically different chain segments. Consequently, the size-scale of the structures is limited to the molecular dimensions of the chain segments1.

The additional chemical functionality of the block copolymers not only offers the possibility to create various structures and morphologies but also structures being suitable for further modification via polymer analogue reactions.

Herein, we report on the synthesis of block copolymers consisting of a methacrylate based block and a pentafluorostyrene block being suitable for efficient post-functionalizations2,3. Techniques like NMR, GPC and DSC were applied to verify structure, molar masses, molecular weight distributions and thermal properties. Furthermore, thin polymer films were prepared, which can be modified selectively in the polypentafluorostyrene (PPFS) domains.

(1) Fasolka, M. J.; Mayes, A. M. Annu. Rev. Mater. Res. 2001, 31, 323-355.
(2) Becer, C. R.; Babiuch, K.; Pilz, D.; Hornig, S.; Heinze, T.; Gottschaldt, M.; Schubert, U. S. Macromolecules 2009, 42, 2387-2394.
(3) Riedel, M.; Stadermann, J.; Komber, H.; Simon, F.; Voit, B. European Polymer Journal, In Press, Corrected Proof.

Quelle
Polymer Preprints 52

Seiten
642

DOI
http://abstracts.acs.org/chem/242nm/program/view.php?obj_id=83613

Erschienen am
July 2011
 
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