Stadermann, J. ; Erber, M. ; Komber, H. ; Voit, B.
Functionalized block copolymers fort he preparation of patterned and functional surfaces
Herein, the synthesis and characterization of new functionalized block copolymers is reported. The polymer materials consisting of a polar block with acid groups and a nonpolar block with alkyne units show a strong tendency of phase segregation. Techniques like NMR, GPC and DSC were applied to verify structure, molar masses, molecular weight distributions and thermal properties. Thin films of these polymers show a distinct surface patterning of mesoscopic dimension. Furthermore, phase separated photosensitive block copolymers were designed and the fabrication of self assembled and additionally photopatternable polymer surfaces is demonstrated.
Quelle
Polymer Preprints 51, 336
DOI
http://abstracts.acs.org/chem/239nm/program/view.php?obj_id=12236
Erschienen am
February 2010
Functionalized block copolymers fort he preparation of patterned and functional surfaces
Herein, the synthesis and characterization of new functionalized block copolymers is reported. The polymer materials consisting of a polar block with acid groups and a nonpolar block with alkyne units show a strong tendency of phase segregation. Techniques like NMR, GPC and DSC were applied to verify structure, molar masses, molecular weight distributions and thermal properties. Thin films of these polymers show a distinct surface patterning of mesoscopic dimension. Furthermore, phase separated photosensitive block copolymers were designed and the fabrication of self assembled and additionally photopatternable polymer surfaces is demonstrated.
Quelle
Polymer Preprints 51, 336
DOI
http://abstracts.acs.org/chem/239nm/program/view.php?obj_id=12236
Erschienen am
February 2010
