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Publications Anita Förster

1.Förster, A.; Drechsler, A.; Kobsch, O.; Synytska, A.; Caspari, A.; Bellmann, C.; Grundke, K.; Stamm, M.; Heller, M.; Gierth, J.; Voigt, M.; Völkel, L.
Anionic surfactants for defect suppression in 193-nm lithography - Study of the adsorption process by ellipsometry andstreaming potential measurements more
Colloids and Surfaces A: Physicochemical and Engineering Aspects 371 (2010) 8-13
 
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