Departments > Nanostructured Materials > Equipment > Ellipsometry

Ellipsometry

Null-Ellipsometer “Multiscope” Optrel, Berlin

Accuracy Δ±0.005°, Ψ±0.005°;

  • Information about layers growth (ex- or in-situ) and optical properties of the samples can be derived, using the ellipsometry method.
  • surface modification
  • swelling phenomena
  • “in situ” monitoring of adsorption processes at interfaces
  • red He-Ne laser with a wavelength 632.8 nm is used

For further information please contact: Dr. Sebastian Rauch

Ellipsometer SE 402

Sentech Instruments GmbH, Berlin

The ellipsometer delivers information about the surface modification (thickness) of substrates

  • red He-Ne laser with a wavelength 632.8 nm is used
  • incident angle of the laser measures at 70°
  • After the sample surface is reached, the reflected light passes through the analyzer and drops onto a photo multiplier, which operates as a detector
  • The control of the ellipsometer and the data evaluation requires special software

For further information please contact:
Dr. Petra Uhlmann

 
Ellipsometry
Ellipsometry

Departments

Nanostructured Materials

Equipment